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Semi Insulating 2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer

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Semi Insulating 2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer

Semi Insulating  2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer
Semi Insulating  2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer Semi Insulating  2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer Semi Insulating  2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer

Large Image :  Semi Insulating 2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer

Product Details:
Place of Origin: CHINA
Brand Name: zmkj
Model Number: InP-2INCH
Payment & Shipping Terms:
Minimum Order Quantity: 3pcs
Price: by case
Packaging Details: single wafer case
Delivery Time: 3-4weeks
Supply Ability: 1000pcs/month

Semi Insulating 2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer

Description
Materials: InP Single Crystal Industry: Semiconductor Substrates,device,
Color: Black Type: Semi- Type
Diameter: 100mm 4inch Thickness: 625um Or 350um
Package: Single Wafer Case
High Light:

50mm indium Phosphide Wafer

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Semi Insulating indium Phosphide Wafer

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n type inp wafer

2inch dia50.8mm n-type dummy prime grade InP indium Phosphide Wafer

4inch Semi-Insulating Indium Phosphide InP Wafer for LD Laser Diode,semiconductor wafer,3inch InP wafer,single crystal wafer​2inch 3inch 4inch InP substrates for LD application, semiconductor wafer,InP wafer,single crystal wafer

 

 

InP introduce                                                                                                          

 

 

InP single crystal
Semi Insulating  2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer 0

Semi Insulating  2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer 1

 growth (modified Czochralski method) is used to pull a single 

crystal through a boric oxide liquid encapsulant starting from a seed.

The dopant (Fe, S, Sn or Zn)is added to the crucible along with the polycrystal. High pressure is applied inside the chamber to prevent decomposition of the Indium Phosphide.he company has developed a process to yield fully stoechiometric, high purity and low dislocation density inP single crystal.

The tCZ technique improves upon the LEC method thanks

to a thermal baffle technology in connection with a numerical

modeling of thermal growth conditions. tCZ is a cost-effective

mature technology with high quality reproducibility from boule to boule

 

Specification                                                                                                    

 

Fe Doped InP

Semi-Insulating InP Specifications

 

Note: Other Specifications maybe available upon request

 

n- and p-type InP

Semi-conducting InP Specifications

Growth Method VGF
Dopant n-type: S, Sn AND Undoped; p-type: Zn
Wafer Shape Round (DIA: 2", 3", AND 4")
Surface Orientation (100)±0.5°

*Other Orientations maybe available upon request

Dopant S & Sn (n-type) Undoped (n-type) Zn (p-type)
Carrier Concentration (cm-3) (0.8-8) × 1018 (1-10) × 1015 (0.8-8) ×1018
Mobility (cm2/V.S.) (1-2.5) × 103 (3-5) × 103 50-100
Etch Pitch Density (cm2) 100-5,000 ≤ 5000 ≤ 500
Wafer Diameter (mm) 50.8±0.3 76.2±0.3 100±0.3
Thickness (µm) 350±25 625±25 625±25
TTV [P/P] (µm) ≤ 10 ≤ 10 ≤ 10
TTV [P/E] (µm) ≤ 10 ≤ 15 ≤ 15
WARP (µm) ≤ 15 ≤ 15 ≤ 15
OF (mm) 17±1 22±1 32.5±1
OF / IF (mm) 7±1 12±1 18±1
Polish* E/E, P/E, P/P E/E, P/E, P/P E/E, P/E, P/P

*E=Etched, P=Polished

Note: Other Specifications maybe available upon request

 

InP Wafer processing
Semi Insulating  2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer 0
Each ingot is cut into wafers which are lapped, polished and surface prepared for epitaxy. The overall process is detailed hereunder.

Semi Insulating  2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer 3
Flat specification and identification The orientation is indicated on the wafers by two flats (long flat for orientation, small flat for identification). Usually the E.J. standard (European-Japanese) is used. The alternate flat configuration (U.S.) is mostly used for Ø 4" wafers.
Semi Insulating  2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer 3
Orientation of the boule Either exact (100) or misoriented wafers are offered.
Semi Insulating  2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer 3
Accuracy of the orientation of OF In response to the needs of the optoelectronic industry, we offers wafers with excellent accuracy of the OF orientation : < 0.02 degrees. This feature is an important benefit to customers making edge-emitting lasers and also to manufacturers who cleave to separate dies – allowing their designers to reduce the “real-estate” wasted in the streets.
Semi Insulating  2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer 3
Edge profile There are two common specs : chemical edge processing or mechanical edge processing (with an edge grinder).
Semi Insulating  2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer 3
Polishing Wafers are polished by means of a chemical-mechanical process resulting in a flat, damage-free surface. we provides both double-side polished and single-side polished (with lapped and etched back side) wafers.
Semi Insulating  2 Inch 50mm N Type Dummy InP Indium Phosphide Wafer 3
Final surface preparation and packaging Wafers go through many chemical steps to remove the oxide produced during polishing and to create a clean surface with stable and uniform oxide layer that is ready for epitaxial growth - epiready surface and that reduces trace elements to extremely low levels . After final inspection, the wafers are packaged in a way that maintains the surface cleanliness.
Specific instructions for oxide removal are available for all types of epitaxial technologies (MOCVD, MBE).
 

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Package & delivery  

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FAQ:

Q: What's your MOQ and delivery time?

A: (1) For inventory, the MOQ is 5 pcs.

   (2) For customized products, the MOQ is 10-30 pcs up.

  (3) For customized products,the delivery time in 10days, custiomzed size for 2-3weeks 

Contact Details
SHANGHAI FAMOUS TRADE CO.,LTD

Contact Person: Wang

Tel: +8615801942596

Send your inquiry directly to us (0 / 3000)