Undoped Semi - Insulating Gallium Nitride Wafer HVPE And Template Type

Undoped Semi - Insulating Gallium Nitride Wafer HVPE And Template Type

  • High Light

    gan substrate


    gan template

  • Material
    GaN Single Crystal
  • Industry
    Semiconductor Wafer,LED
  • Application
    Semiconductor Device,LD Wafer,LED Wafer, Explorer Detector,laser,
  • TYPE
    Un Doped Semi Type
  • Customized
  • Size
    2inch Or Small Customized
  • Thickness
  • Place of Origin
  • Brand Name
  • Model Number
  • Minimum Order Quantity
  • Price
    by case
  • Packaging Details
    single wafer case in 100-grade cleaning room
  • Delivery Time
  • Payment Terms
    L/C, , T/T
  • Supply Ability

Undoped Semi - Insulating Gallium Nitride Wafer HVPE And Template Type

2inch HVPE method Gallium Nitride GaN wafer ,free standing GaN substrates for LD,10x10mm size GaN chips,HVPE GaN wafer


About GaN Feature Introduce

The growing demand for high-speed, high-temperature and high power-handling capabilities has made        

the semiconductor industry rethink the choice of materials used as semiconductors. For instance,                      

as various faster and smaller computing devices arise, the use of silicon is making it difficult to sustain         Moore’s Law. But also in power electronics, So GaN semiconductor wafer is grown out for the need.              

 Due to its unique characteristics (high maximum current, high breakdown voltage, and high switching           frequency), Gallium Nitride  GaN is the unique material of choice to solve energy problems of the future.         GaN based systems have higher power efficiency, thus reducing power losses, switch at higher frequency, thus reducing size and weight.                                                                                                                              

GaN technology is used in numerous high-power applications such as industrial, consumer and server            power supplies, solar, AC drive and UPS inverters, and hybrid and electric cars. Furthermore,                       

GaN is ideally suited for RF applications such as cellular base stations, radars and cable TV                             

infrastructure in the networking, aerospace and defense sectors, thanks to its high breakdown strength,      

low noise figure and high linearity.








2”GaN Substrates  
Dimensions Ф 50.8mm ± 1mm
Marco Defect Density A Level ≤ 2 cm-2
B Level > 2 cm-2
Thickness 330 ± 25 µm
Orientation C-axis(0001) ± 0.5°
Orientation Flat (1-100) ± 0.5°, 16.0 ± 1.0mm
Secondary Orientation Flat (11-20) ± 3°, 8.0 ± 1.0mm
TTV(Total Thickness Variation) ≤15 µm
BOW ≤20 µm
Conduction Type N-type Semi-Insulating
Resistivity(300K) < 0.5 Ω·cm >106 Ω·cm
Dislocation Density Less than 5x106 cm-2
Useable Surface Area > 90%
Polishing Front Surface: Ra < 0.2nm. Epi-ready polished
Back Surface: Fine ground
Package Packaged in a class 100 clean room environment, in single wafer containers, under a nitrogen atmosphere.


Undoped Semi - Insulating Gallium Nitride Wafer HVPE And Template Type 0


  1. - Various LED's: white LED, violet LED, ultraviolet LED, blue LED
  2. - Laser diodes: violet LD, green LD for ultra small projectors.
  3. - Power electronic devices
  4. - High frequency electronic devices
  5. - Environmental detection
  6. ■ Usage
  7. Substrates for epitaxial growth by MOCVD etc.