SSP / DSP Sapphire Wafer Substrate Wear Resistance For Optical Lens

ultrathin sapphire glass wafer ,4inch 0.5mm C-axis sapphire wafer for epi-ready,sapphire thick glass lens for covering,sapphire optical windows,4inch 0.3mm thickness sapphire wafer,
 

   Chemically, sapphire is single crystal aluminum oxide (Al2O3), and is useful in a transmission range from 0.2 - 5.5µm.Sapphire , so making them ideal materials for demanding applications (such as laser systems) because of their extreme surface hardness, high thermal conductivity, high dielectric constant and resistance to common chemical acids and alkalis. And sapphire also  is the second hardest crystal next to diamonds and, because of their structural strength, sapphire windows can be made much thinner than other common dielectric windows with improved transmittance. 
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Material Sapphire(Al2O3)
Density(20°C) Kg/m3                 3.98×103
Crystal Structure                         hexagonal
Crystal lattice constant          a=4.785Å c=12.991 Å
Mohs hardness                            9
Melting Point                               2045°C
Boiling Point                                3000°C
Coefficient of Thermal Expansion    α=5.8×10 -6 /K
Specific heat                          0.418W.s/g/k
Thermal conductio                  25.12W/m/k(@100°C)
Refractive Index (nd)               no=1.768ne=1.76
dn/dt                                         13×10-6/K(@633nm)
Tranmission                            T≈85%(0.3~5um)
Permittivity                               11.5(//c), 9.3(⊥c)

Applications
Sapphire Washers, Sapphire Windows, Sapphire Bearings, Sapphire Rods, Sapphire Tubes, Ruby
sapphire wafer, dome sapphire, Sapphire insulation Film, Sapphire ball lens, Sapphire/ruby ball

1. OF Orientation flat: A axis±0.1° 
2. Frontside Surface Roughness:Ra＜0.3nm
3. Backside Surface Roughness: 0.8~1.2um 
4. ( Or double side polished,  both side Ra＜0.2nm)
5. TTV:＜15um     BOW:-15~0um      WARP:＜20um
6. Laser Mark Series No. by needs
7. Package:Vacuum-sealed containers with nitrogen backfill in a class 100 environment

Sapphire Wafer Process Step

 
Sample