| Brand Name: | ZMSH |
| MOQ: | 50 |
| Delivery Time: | 2-4 WEEKS |
| Payment Terms: | T/T |
![]()
The 12-inch (300 mm) Silicon Carbide (SiC) substrate represents the current frontier in wide-bandgap (WBG) semiconductor technology. As the global industry transitions toward higher efficiency and higher power density, this large-diameter crystalline platform provides the essential foundation for next-generation power electronics and RF systems.
Key Strategic Advantages:
Product Grade Offerings:
4H-N Silicon Carbide (Conductive Type)
The 4H-N polytype is a nitrogen-doped, hexagonal crystal structure known for its robust physical properties. With a wide bandgap of approximately 3.26 eV, it provides:
4H-SI Silicon Carbide (Semi-Insulating Type)
Our SI substrates are characterized by exceptionally high resistivity and minimal crystalline defects. These substrates are the preferred platform for GaN-on-SiC RF devices, providing:
Our manufacturing process is vertically integrated to ensure total quality control from raw material to finished wafer.
| Item | N-Type Production | N-Type Dummy | SI-Type Production |
|---|---|---|---|
| Polytype | 4H | 4H | 4H |
| Doping Type | Nitrogen (N-type) | Nitrogen (N-type) | Semi-insulating |
| Diameter | 300 ± 0.5 mm | 300 ± 0.5 mm | 300 ± 0.5 mm |
| Thickness (Green/Trans) | 600/700 ± 100 μm | 600/700 ± 100 μm | 600/700 ± 100 μm |
| Surface Orientation | 4.0° toward <11-20> | 4.0° toward <11-20> | 4.0° toward <11-20> |
| Orientation Accuracy | ± 0.5° | ± 0.5° | ± 0.5° |
| Primary Flat | Notch / Full round | Notch / Full round | Notch / Full round |
| Notch Depth | 1.0 – 1.5 mm | 1.0 – 1.5 mm | 1.0 – 1.5 mm |
| Flatness (TTV) | ≤ 10 μm | N/A | ≤ 10 μm |
| Micropipe Density (MPD) | ≤ 5 ea/cm² | N/A | ≤ 5 ea/cm² |
| Surface Finish | Epi-ready (CMP) | Precision Grinding | Epi-ready (CMP) |
| Edge Processing | Rounded Chamfer | No Chamfer | Rounded Chamfer |
| Crack Inspection | None (3mm exclusion) | None (3mm exclusion) | None (3mm exclusion) |
![]()
We utilize a multi-step inspection protocol to guarantee consistent performance in your production line:
A: By providing a much larger surface area, you can fabricate significantly more chips per wafer. This reduces the fixed costs of processing and labor per chip, making your final semiconductor products more competitive in the market.
A: The 4° orientation toward the <11-20> plane is optimized for high-quality epitaxial growth, helping to prevent the formation of unwanted polytypes and reducing basal plane dislocations (BPD).
A: Yes. We offer customized laser marking on the C-side (carbon face) according to SEMI standards or specific customer requirements to ensure full batch traceability.
A: Yes, the N-type Dummy Grade shares the same thermal properties as the Production Grade, making it perfect for testing thermal cycles, furnace calibration, and handling systems.