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Home > Products > Indium Phosphide Wafer > 3.58 Density Mgo Substrate / Mgo Wafer Magnesium Oxide Crystal Substrate

3.58 Density Mgo Substrate / Mgo Wafer Magnesium Oxide Crystal Substrate

Product Details

Place of Origin: CHINA

Brand Name: zmkj

Model Number: MgO-001

Payment & Shipping Terms

Minimum Order Quantity: 10pcs

Price: by case

Packaging Details: single wafer case

Delivery Time: 1-4weeks

Supply Ability: 1000pcs/month

Get Best Price
Highlight:

inp wafer

,

gap wafer

Materials:
MgO Single Crystal
Industry:
Semiconductor Substrates,device,
Color:
WHITE
Crystal Structure:
Cube
Density:
3.58
Size:
10x10,20x20,5x5mmt
Polished:
DSP/ SSP OK
Materials:
MgO Single Crystal
Industry:
Semiconductor Substrates,device,
Color:
WHITE
Crystal Structure:
Cube
Density:
3.58
Size:
10x10,20x20,5x5mmt
Polished:
DSP/ SSP OK
3.58 Density Mgo Substrate / Mgo Wafer Magnesium Oxide Crystal Substrate

MgO substrates,10X10mm MgO wafer,semiconductor wafer,Magnesium oxide (MgO) crystal substrate, crystals supplier MgO WAFER 5x5mm
 
Product Description:
Magnesium oxide (MgO) is excellent for monocrystalline substrate is widely used in production of the ferroelectric thin film,
he magnetic film, optical film and the high-temperature superconducting thin film, etc., as it is in the microwave band dielectric constant and loss are small, and can obtain a large area of a substrate (a diameter of 2 inches and larger), it is the current industry, an important high-temperature superconducting thin film of single-crystal substrates. Can be used to make mobile communication equipment required for high-temperature superconducting microwave filters and other devices. we  are discharge using a special high purity growth size of about 2 "x2" x 1 ", low-cost single crystal MgO, prepared by chemical mechanical polishing the surface of high quality substrates atomically.

Technical parameters:

 

Crystal structureCube
Lattice constanta = 4.216Å
Growth methodArc France
Mp2850 °C
Density3.58g/cm3
Mohs hardness5.5 Mohs
Thermal expansion coefficient12.8 × 10 -6 / °C
Permittivity9.8
Optical transmission
> 90% @ 200 ~ 400 nm> 98% 500 ~ 1000 nm
Crystal cleavage plane 
<100>
Specifications:

<100>, <110>, <111> Tolerance: + / -0.5 degrees
dia2 "x0.5mm, 10x10x0.5mm, 15x15x0.5mm,10x3mmt,10x5mmt,20X15mmt,20x20mmt,
Single side polished or double 2sp, Ra <5A
Note: according to customers' requirements and size of the corresponding direction.

Standard Packaging:1000 clean room, 100 clean bag or single box packaging

 
 
3.58 Density Mgo Substrate / Mgo Wafer Magnesium Oxide Crystal Substrate 0
 
3.58 Density Mgo Substrate / Mgo Wafer Magnesium Oxide Crystal Substrate 1
 
FAQ:
Q: Do you have standard products?
A: Our standard products on standard orientation in stock.

 

Q: What's your MOQ?
A: (1) For inventory, the MOQ is 10pcs.
(2) For customized products, the MOQ is 25pcs up.

 

Q: What's the way of shipping and cost?
A:(1) We accept DHL, Fedex, EMS etc.
(2) If you have your own express account, it's great.If not,we could help you ship them.
Freight is in accordance with the actual settlement.
Q: How to pay?
A: 100%T/T, Paypal, Secure payment and Assurance payment .
Q: What's the delivery time?
A: (1) For the standard products
For inventory: the delivery is 5 workdays after you place the order.
For customized products: the delivery is 2 or 3 weeks after you place the order.
 
Q: Can I customize the products based on my need?
A: Yes, we can customize the material, specifications,shape,thickness by your need.