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4'' 5'' SiO2 Single Crystal IC Chips CZ Method 500um 1mm Oxidation Layer 500nm 2μM
  • 4'' 5'' SiO2 Single Crystal IC Chips CZ Method 500um 1mm Oxidation Layer 500nm 2μM
  • 4'' 5'' SiO2 Single Crystal IC Chips CZ Method 500um 1mm Oxidation Layer 500nm 2μM
  • 4'' 5'' SiO2 Single Crystal IC Chips CZ Method 500um 1mm Oxidation Layer 500nm 2μM

4'' 5'' SiO2 Single Crystal IC Chips CZ Method 500um 1mm Oxidation Layer 500nm 2μM

Place of Origin China
Brand Name ZMSH
Certification ROHS
Model Number SiO2 Chips
Product Details
Material:
SiO2 Chips
Diameter:
4'' 5''
Thickness:
500um 1mm
Orientation:
111
TTV:
5um
Warp:
5um
Bow:
5um
Ra:
0.2nm
Application:
IC Wafers
High Light: 

CZ Method SiO2 IC Chips

,

SiO2 Single Crystal IC Chips

,

5'' IC Silicon Wafer

Product Description

4'' 5'' SiO2 Single Crystal IC Chips CZ Method 500um 1mm Oxidation Layer 500nm 2μm

 

Description:

Monocrystalline silicon is a more active non-metallic element, is an important part of crystal materials, in the forefront of the development of new materials. Its main use is as a semiconductor material and the use of solar photovoltaic power generation, heating and so on. Because solar energy has many advantages such as clean, environmental protection and convenience, in the past 30 years, solar energy utilization technology has achieved great development in research and development, commercial production and market development, and has become one of the world's rapid and stable development of emerging industries. Monocrystalline silicon wafer is monocrystalline silicon rod cut through a series of processes, the preparation of monocrystalline silicon methods include CZ method (CZ method), zone melting method (FZ method) and epitaxy method, in which the cZ method and zone melting method are used to prepare monocrystalline silicon rod. The largest demand for zone-fused silicon single crystals comes from power semiconductor devices.

 

 

Features:

Silica can be divided into natural silica and synthetic silica two categories. Natural silica is mainly ultrafine powder formed by high grade silicon ore through mechanical grinding and other physical methods, usually quartz powder or silicon powder. Synthetic silica is an amorphous synthetic silicon oxide powder material, although its structure and carbon black are different, but the application performance is similar to carbon black, and the appearance is white, so it is customary to call it "white carbon black". Synthetic silica is normally white flocculent powder, physical properties for high temperature resistance, non-flammable, non-toxic, tasteless, with good electrical insulation, so widely used in rubber, plastics, coatings, adhesives, sealants, thermal insulation materials and other fields. Synthetic silica is mainly divided into fumed silica and liquid phase silica, and liquid phase silica can be divided into precipitated silica and gel silica.

 

 

Technical Parameters:

Items Parameters
Density 2.5g/cm3
Melting point 1700℃
Boiling point 2330℃
Refractive index 1.8
Mol. wt 61.080
Appearance light grey
Solubility Insoluble
Sinter point 880℃~1490℃
Preparation method dry/wet oxidation
Warp 5um
Bow 5um
TTV 5um
Orientation 111
Ra 0.3nm
Resisitivity 0.001-50(Ω•cm)
Tolerance ±0.4mm
Type N-type; P-type
Polishing SSP DSP

 

 

Applications:

Industrial SiO2 is called white carbon black, which is light in weight and is an ultra-fine powder. It is a nanomaterial with great industrial application prospects, and its application fields are very wide, almost involving all the industries that use silica powder. At present, the preparation methods of silica mainly include: gas phase method, precipitation method, hydrothermal synthesis method, microemulsion reaction method, azeotrope distillation method and hypergravity reaction method.

1. The manufacture of glass, quartz glass, water glass, optical fiber, electronic industry parts, optical instruments, crafts and refractory materials.

2. Can be used for egg powder, powdered sugar, milk powder, cocoa powder, cocoa butter, plant powder, instant coffee, soup powder, etc.

3. When the silica crystal is perfect, it is crystal; Silica gel after dehydration is agate; When the silica grain is less than a few microns, it consists of chalcedony, chert and secondary quartzite.

4'' 5'' SiO2 Single Crystal IC Chips CZ Method 500um 1mm Oxidation Layer 500nm 2μM 0

 

 

 

Other product:

SIC wafer:

4'' 5'' SiO2 Single Crystal IC Chips CZ Method 500um 1mm Oxidation Layer 500nm 2μM 1

 

 

 

 

FAQ:

Q: What is the Brand Name of SiO2 Single Crystal?

A: The Brand Name of SiO2 Single Crystal is ZMSH.

 

Q: What is the Certification of SiO2 Single Crystal?

A: The Certification of SiO2 Single Crystal is ROHS.

 

Q: Where is the Place of Origin of SiO2 Single Crystal?

A: The Place of Origin of SiO2 Single Crystal is CHINA.

 

Q: What is the MOQ of SiO2 Single Crystal at one time?

A: The MOQ of SiO2 Single Crystal is 25pcs at one time.

 

 

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