4inch SiC Epitaxial Wafer 4H-N Diameter 100mm Thickness 350μm Prime Grade
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6inch SiC Epitaxial Wafer Diameter 150mm 4H-N Type 4H-P Type For 5G Communication
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Customized SiC Ceramic End Effector For Wafer Handling
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High-Purity SiC Vertical Furnace Tube High-Temperature Resistant
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Customized Quartz Bell Jars with Coating Options for Semiconductor Plasma Generators
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Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing
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EFG Sapphire Tube – High-Performance Optical and Industrial Applications
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High Purity (5N) Single Crystal Silicon Electrode with Customizable Gas Hole Diameter and Multiple Resistivity Options for Semiconductor Plasma Systems
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Precision Silicon Ring (Si Ring) for Semiconductor Plasma Etching Systems in Single Crystal and Polycrystalline Silicon
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AL2O3 Sapphire Tube Polishing Customzied Size High Hardness Transparency
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4H-SEMI SiC Substrate 2 Inch Thickness 350um 500um Prime/Dummy Grade AR Glasses Optical Grade
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Customized SiC Ceramic Boat Carrier For Wafer Handling