Product Details
Place of Origin: CHINA
Brand Name: ZMSH
Certification: rohs
Model Number: SiC 4H-P
Payment & Shipping Terms
Price: by case
Payment Terms: T/T
Supply Ability: 1000pc/month
Polytype: |
4H-P |
Density: |
3.23 G/cm3 |
Mohs Hardness: |
≈9.2 |
Surface Orientation: |
On Axis: [1120] ± 0.5° For 4H-P |
Packaging: |
Single Independent Aseptic Packaging, Cleanliness Level 100 |
Application: |
LED Chip, Satellite Communication |
Polytype: |
4H-P |
Density: |
3.23 G/cm3 |
Mohs Hardness: |
≈9.2 |
Surface Orientation: |
On Axis: [1120] ± 0.5° For 4H-P |
Packaging: |
Single Independent Aseptic Packaging, Cleanliness Level 100 |
Application: |
LED Chip, Satellite Communication |
4H-P type silicon carbide substrate is a semiconductor material with a hexagonal lattice structure, and P-type conductivity is obtained by a specific doping process (such as doping aluminum and other elements). Such substrates typically have high doping concentrations and low resistivity, making them ideal for manufacturing high-power devices. An axis of 0° usually refers to the fact that a particular crystal direction or positioning edge of the substrate has an Angle of 0° from a reference direction (such as the substrate plane), which helps to ensure the consistency and reliability of the device in subsequent manufacturing processes.
Propery |
P-type 4H-SiC, Single Crystal |
Lattice Parameters |
a=3.082 Å c=10.092 Å |
Stacking Sequence |
ABCB |
Mohs Hardness |
≈9.2 |
Density |
3.23 g/cm3 |
Therm. Expansion Coefficient |
4.3×10-6/K(⊥Caxis) 4.7×10-6/K( ∥Caxis) |
Refraction Index @750nm |
no = 2.621 ne = 2.671 |
Dielectrc Constant |
c~9.66 |
Thermal Conductivity |
3-5 W/cm·K@298K |
Band-Gap |
3.26 eV |
Break-Down Electrical Field |
2-5×106V/cm |
Saturation Drift Velocity |
2.0×105m/s |
Wafer Orientation |
On axis: [1120] ± 0.5° for 4H/6H-P |
ZMSH provides a full range of silicon carbide substrate 4H-P (axis 0°) services, including precision custom processing to meet customer specific needs, the use of professional logistics channels to ensure product safety and on-time delivery, and the use of shock-proof, moisture-proof packaging materials carefully packaged and delivered to ensure high-quality delivery of silicon carbide substrates.
1. Q: What is the difference between 4H-P type and 6H type silicon carbide substrate?
A:Compared with 6H, 4H-P SIC substrate has higher electron mobility and better thermal conductivity, which is suitable for manufacturing high performance power devices.
2. Q:What is the effect of axis 0° on the performance of silicon carbide substrate?
A:The setting of the shaft to 0° helps to ensure the consistency and reliability of the device in the subsequent manufacturing process, improving the electrical performance and stability of the device.
Tag: #Sic wafer, #silicon carbide substrate, #4H-P type, #axis 0°, #High purity, #Sic 4H-P type