Product Details
Place of Origin: China
Brand Name: zmsh
Payment & Shipping Terms
Material: |
ANTI-STATIC PP |
Space&Size: |
201MM, 301MM |
Package: |
16PCS/carton,8PCS/carton |
Material: |
ANTI-STATIC PP |
Space&Size: |
201MM, 301MM |
Package: |
16PCS/carton,8PCS/carton |
The Horizontal Wafer Carrier represents a critical innovation in semiconductor manufacturing, designed to safely transport and store delicate wafers (150mm to 450mm) during fabrication processes. Engineered for cleanroom compatibility and process stability, these carriers utilize advanced materials and precision engineering to minimize particle generation while maximizing wafer throughput in deposition, etching, and inspection equipment.
Unlike traditional vertical carriers, horizontal designs provide:
Dual-Cover Inner Ring Technology:
Upper ring: Precision-machined aluminum alloy with PVD ceramic coating
12-point wafer contact system with 0.05mm tolerance
Integrated strain gauges for real-time wafer stress monitoring (optional)
Lower ring: Carbon-fiber reinforced composite
3-zone dampening fingers with adjustable stiffness (5-15N/mm)
Automatic thermal compensation for -40°C to 200°C operation
Performance Data:
Wafer shift <0.1mm at 2.5m/s² acceleration
Edge exclusion zone reduced to 0.5mm (from typical 2mm)
0% wafer breakage in 1 million cycle testing
Multi-Layer Protection Architecture:
Primary absorption: Viscoelastic polymer dampeners (15G rating)
Secondary buffer: Titanium spring system in base plate
Tertiary protection: Impact-resistant polycarbonate buffer zones
Vibration Performance:
5x better vibration isolation than previous gen (0.01g transmission at 100Hz)
Maintains <0.2μm TIR (Total Indicated Runout) during AMHS transport
Smart Features:
Integrated IoT sensors (temperature, humidity, vibration)
Wireless charging for continuous sensor operation
Predictive maintenance alerts via factory MES integration
Automation Interfaces:
Standard E84/E87 robotic end effector compatibility
Tool-free quick release mechanism (<30s latch replacement)
Auto-alignment guides with ±0.1mm repeatability
Particle Control:
All moving parts feature particle traps with >95% capture efficiency
Ceramic-coated sliding surfaces (<0.01 particles/cm³ generation)
Periodic purge ports for nitrogen cleaning
Safety Enhancements:
Laser-etched markings recessed 0.3mm below surface
All sharp edges radiused to >0.5mm
Anti-static materials (10⁶-10⁹ Ω/sq surface resistance)
Parameter | Specification |
Compatibility | SEMI E15.1, E47.1, E158 |
Material | PP |
Max Wafer Bow | <0.2mm @ 450mm wafer |
Particle Adders | <5 @ ≥0.1μm (per SEMI E72) |
Load Capacity | 25 wafers @ 300mm (1.0mm thick) |
Weight | 3.8kg (empty), 5.2kg (loaded) |
RFID Frequency | 13.56 MHz (ISO/IEC 18000-3) |
Q1: Why choose horizontal over vertical carriers?
A1: Horizontal orientation recreases wafer deflection by 60% (per SEMI E158-1119), critical for <5nm node processing.
Q2: How do you prevent wafer sticking?
A2: Our nano-patterned pocket surfaces reduce contact area by 85% versus standard designs.
Q3: What's the maintenance schedule?
A3: 50,000 cycles before pad replacement; full refurbishment every 200k cycles.
Q4: How do you handle wafer breakage?
A4: Fragmented wafer containment pockets prevent cross-contamination.
Q5: Can carriers be used in vacuum chambers?
A5: Yes - special outgassing-optimized versions available (<10⁻⁶ Torr·L/sec).