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The Precision Multi-Wire Saw for Semiconductor Wafer Cutting is an industrial slicing system developed for applications requiring controlled wire motion, stable tension, precision feed, thin-section cutting and consistent machine rigidity.
The equipment integrates wire supply and take-up, wire traversing, tension control, guide wheels, main roller drive, workpiece feeding, slurry circulation, heat exchange and electrical control into a single machine platform. The supplied equipment documentation identifies its intended industry application as semiconductor wafer slicing.
With a maximum specified wire speed of 2200 m/min, a supported wire diameter range of 0.014–0.10 mm, adjustable tension from 0 to 15 N, and variable cutting feed from 0.01 to 5 mm/min, the system provides a flexible platform for fine-wire wafer slicing processes.
This machine can be considered for semiconductor production lines, pilot production, material processing facilities and research environments where slicing accuracy, wire stability and equipment repeatability are important.
The machine supports a maximum wire speed of:
2200 m/min
High wire speed is especially important when finer wire is used, because cutting force and process stability must still be maintained as the wire diameter decreases.
The available wire diameter range is:
0.014 mm to 0.10 mm
This allows users to select wire specifications according to the target slicing process.
Wire tension can be controlled from:
0–15 N
The tension arm is used to maintain the steel wire at the selected tension during operation. According to the machine configuration, the tension control system is motor driven and can be adjusted according to process requirements.
Stable tension is one of the key mechanical conditions for maintaining predictable wire movement during wafer slicing.
The machine uses a controlled feed unit with a maximum travel of approximately:
220 mm
Cutting feed speed:
0.01–5 mm/min
Rapid feed speed:
200 mm/min
The workpiece is fixed to the feed unit and moved through the cutting area according to the selected process parameters.
The standard processing envelope specified for the equipment is:
| Parameter | Specification |
|---|---|
| Maximum Workpiece Size | W90 × H220 × L450 mm |
| Maximum Workpiece Length | 450 mm |
| Feed Travel | ≤220 mm |
| Workpiece Clamping | Automatic hydraulic clamping |
| Cutting Direction | Downward feed |
| Wire Movement | Reciprocating / Unidirectional |
The system also supports combined workpiece loading according to the original technical configuration.
| Item | Specification |
|---|---|
| Maximum Wire Speed | 2200 m/min |
| Wire Diameter | 0.014–0.10 mm |
| Maximum Wire Storage | 100 km |
| Wire Tension | 0–15 N |
| Feed Stroke | ≤220 mm |
| Cutting Feed Speed | 0.01–5 mm/min |
| Rapid Feed | 200 mm/min |
| Main Roller Speed | <4500 r/min |
| Main Roller Maximum Diameter | Ø160 mm |
| Main Roller Quantity | 3 pcs + 3 spare |
| Slurry Tank Capacity | 300 L |
| Workpiece Clamping | Automatic hydraulic |
| Wire Break Detection | Included |
| Standard Power Supply | AC 380 V ±10%, 50/60 Hz |
| Machine Dimensions | Approx. L1750 × W1600 × H2900 mm |
| Machine Weight | Approx. 8 tons |
These parameters are taken from the supplied equipment configuration.
The machine includes several coordinated subsystems responsible for controlling wire movement.
The winding unit holds the new wire spool and receiving spool. It is responsible for supplying and storing the steel wire during machine operation.
The traversing mechanism helps the wire unwind smoothly and rewind evenly.
The tension unit maintains the wire at a controlled tension during slicing.
Guide wheels are used to direct the wire and support stable wire travel.
The main spindle section performs the actual slicing operation between the rollers.
The workpiece is secured to the feed system and moved at a programmed speed during cutting.
These units are described as the main components of the overall machine system.
The cutting machine is equipped with a slurry circulation system with a tank capacity of:
300 L
The slurry tank provides cooling and cutting fluid during processing.
A heat exchanger is used to control cutting-liquid temperature through external cooling water. The specified cooling-water requirements include:
| Cooling Parameter | Requirement |
|---|---|
| Water Temperature | 11 ±1°C |
| Water Flow | 20–50 L/min |
| Water Pressure | 0.2–0.4 MPa |
| Cooling Capacity | ≥5 kW |
The cooling-water circuit uses insulation to reduce condensation.
The machine enclosure uses a high-strength steel structure, while the base uses an integrated cast construction to improve overall rigidity.
The equipment is also designed with a tray underneath the machine to reduce the possibility of cutting liquid leaking directly onto the installation floor.
A pneumatic safety device is installed at the upper section of the equipment to improve the safety and stability of the lifting platform.
The drive system uses direct coupling.
According to the supplied equipment specification, the main benefits of the direct-drive structure include:
The main rollers are also individually motor driven. This design is intended to reduce the load transferred from the wire to the rollers and reduce roller groove wear and wire consumption.
The documented roller-axis spacing is approximately:
270 mm
The shorter spacing is designed to reduce the distance between the main rollers and thereby improve cutting conditions.
According to the original technical documentation, this design is intended to improve cutting yield while reducing processing time and wire consumption.
Wire breakage is an important process risk during wafer slicing.
The equipment includes wire break detection as part of its standard technical configuration.
The machine also uses dual-side break alarm monitoring to improve break-detection sensitivity. Its control system incorporates protection intended to reduce wire breakage during unexpected power interruption.
The machine acceptance specification includes several important mechanical inspection parameters:
| Inspection Parameter | Requirement |
|---|---|
| Main Roller Runout | ≤0.02 mm |
| Spindle Box Taper Radial Runout | ≤0.005 mm |
| Spindle Core Axial Runout | ≤0.005 mm |
| Taper Contact Ratio | ≥70% |
| Vertical Feed Straightness | ≤0.005 mm / 150 mm |
| Wire Twist | <5 turns / m |
| Supply/Take-Up Spindle Vibration | ≤5 m/s² |
| Supply/Take-Up Roller Runout | ≤0.15 mm |
These values define the documented machine-level acceptance requirements.
The equipment documentation states:
Cutting accuracy: ±0.01 mm
and
Minimum slicing thickness: <0.05 mm
The exact achievable thickness in production will depend on the workpiece, wire specification, process recipe, cutting fluid, handling method and required yield.
For very thin wafer projects, customers should provide the target thickness and tolerance before equipment configuration is finalized.
Standard machine power:
Three-phase four-wire AC 380 V ±10%, 50/60 Hz
The technical documentation specifies the installation of copper cable of 16 mm² or above.
The referenced machine energy consumption is approximately:
5 kWh
Actual consumption can vary with operating conditions and auxiliary systems.
Recommended environmental conditions include:
| Item | Requirement |
|---|---|
| Ambient Temperature | 18–28°C |
| Relative Humidity | ≤75% |
| Vibration | ≤0.5 G |
The machine specification also confirms support for a maximum wire storage capacity above 100 km when using Ø0.03 mm wire, six guide wheels, a 300 L slurry tank and hydraulic workpiece clamping.
The documented application of this equipment is:
Semiconductor Wafer Slicing.
Typical customer projects may involve different wafer diameters, target thicknesses and production requirements.
Because cutting behavior varies significantly by material, customers planning to process different semiconductor or hard-brittle materials should provide the material information to ZMSH for process evaluation before confirming the final machine configuration.
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Different semiconductor wafer projects can require different:
Optional configurations listed in the equipment documentation include SECS II communication, cooling equipment and workpiece clamping temperature control.
ZMSH can therefore evaluate equipment configuration according to the customer's process requirements.
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For a quotation or technical evaluation, please provide:
Providing these details helps determine the appropriate machine and process configuration.
The maximum specified wire speed is 2200 m/min.
The specified wire diameter range is 0.014–0.10 mm.
The equipment documentation states that slicing thicknesses below 0.05 mm are possible under the relevant operating conditions.