Brief: Discover the 4H-SEMI Silicon Carbide SiC Substrate, a high-performance wafer ideal for power electronics, automotive electronics, and RF devices. Available in 2-inch diameter with thickness options of 350um or 500um, this prime or dummy grade substrate offers exceptional hardness and reliability for demanding applications.
Related Product Features:
Made from SIC Monocrystal for superior quality and performance.
Supports customized designs with specific artwork requirements.
High hardness rating of approximately 9.2 Mohs for durability.
Widely used in high-tech industries like power and automotive electronics.
Available in both prime grade and dummy grade to suit various needs.
Double Side Polish with Si Face CMP for smooth surface finish.
Micropipe density as low as ≤5 micropipes/cm2 for high-quality applications.
Customizable specifications to meet unique project requirements.
Faqs:
How does 4H-SiC Semi ensure the quality of its wafers?
4H-SiC Semi employs advanced manufacturing techniques, including Chemical Vapor Deposition (CVD) and Physical Vapor Transport (PVT), and follows stringent quality control processes to ensure high-quality wafers.
What's the main difference between 4H-N SiC and 4H-SEMI SiC?
The primary difference is that 4H-N SiC (Nitrogen-doped) is n-type semiconductor silicon carbide, whereas 4H-Semi SiC is semi-insulating silicon carbide, which has been processed to have very high resistivity.
Can the 4H-SEMI SiC substrate be customized?
Yes, the 4H-SEMI SiC substrate supports customized designs with specific artwork and specifications to meet unique project requirements.