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Home > Products > Sapphire Wafer > Sapphire Wafer C-Plane to A 0.2±0.1°off 99.999% Al2O3 Dia 50.8 Thickness 430um DSP SSP

Sapphire Wafer C-Plane to A 0.2±0.1°off 99.999% Al2O3 Dia 50.8 Thickness 430um DSP SSP

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Place of Origin: China

Brand Name: zmsh

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Highlight:
Material:
99.999% Sapphire Crystal
Orientation:
C Plane(0001) To A(11-20) 0.2±0.1°off
Diameter:
2", 50.8mm
Bow:
≤20μm
Size:
2inch, 4inch, 6inch, 8inch
TTV:
<5μm
Thickness:
430μm
Material:
99.999% Sapphire Crystal
Orientation:
C Plane(0001) To A(11-20) 0.2±0.1°off
Diameter:
2", 50.8mm
Bow:
≤20μm
Size:
2inch, 4inch, 6inch, 8inch
TTV:
<5μm
Thickness:
430μm
Sapphire Wafer C-Plane to A 0.2±0.1°off 99.999% Al2O3 Dia 50.8 Thickness 430um DSP SSP

2" Sapphire Wafer C-Plane to A 0.2°±0.1° Off, 99.999% Al₂O₃, 430µm Thickness, DSP/SSP

 

This 2-inch sapphire wafer features ultra-precise C-plane to A-axis off-cut (0.2°±0.1°) and 99.999% (5N) purity, optimized for high-performance epitaxial growth and specialized optoelectronic applications. With a 430µm thickness and options for double-side polishing (DSP) or single-side polishing (SSP), the wafer delivers exceptional surface quality (Ra <0.3nm) and crystallographic consistency, making it ideal for GaN-based devices, laser systems, and research-grade substrates. Its controlled off-axis orientation reduces step-bunching defects during epitaxy, while the ultra-high purity ensures minimal impurity-driven performance degradation in sensitive applications like quantum optics and RF filters.

 

Sapphire Wafer C-Plane to A 0.2±0.1°off 99.999% Al2O3 Dia 50.8 Thickness 430um DSP SSP 0

 


 

Key Features

 

Precision Off-Cut Orientation:

C-plane to A-axis 0.2°±0.1° off-cut, engineered to enhance epitaxial layer uniformity and reduce defects in GaN growth.

 

Ultra-High Purity:

99.999% (5N) Al₂O, with trace impurities (Fe, Ti, Si) <5ppm, critical for high-frequency and low-loss devices.

 

Submicron Surface Quality:

DSP/SSP options:

DSP: Ra <0.3nm (both sides), ideal for optical and laser applications.

SSP: Ra <0.5nm (front side), cost-effective for epitaxy.

TTV <5µm for uniform thin-film deposition.

 

Material Excellence:

Thermal Stability: Melting point ~2,050°C, suitable for MOCVD/MBE processes.

Optical Transparency: >90% transmission (400nm–4,000nm).

Mechanical Robustness: 9 Mohs hardness, resistant to chemical etching.

 

Research-Grade Consistency:

Dislocation density <300 cm², ensuring high yield for R&D and pilot production.

 

Sapphire Wafer C-Plane to A 0.2±0.1°off 99.999% Al2O3 Dia 50.8 Thickness 430um DSP SSP 1

 


 

Applications

 

GaN Epitaxy:

LEDs/Laser Diodes: Blue/UV emitters with reduced threading dislocations.

HEMTs: High-electron-mobility transistors for 5G and radar.

 

Optical Components:

Laser Windows: Low scatter loss for CO₂ and UV lasers.

Waveguides: DSP wafers for integrated photonics.

 

Acoustic Wave Devices:

SAW/BAW Filters: Off-cut orientation improves frequency stability.

 

Quantum Technologies:

Single-Photon Sources: High-purity substrates for SPDC crystals.

 

Industrial Sensors:

Pressure/Temperature Sensors: Chemically inert covers for harsh environments.

 

Sapphire Wafer C-Plane to A 0.2±0.1°off 99.999% Al2O3 Dia 50.8 Thickness 430um DSP SSP 2

 


 

Specifications

 

Parameter

Value

Diameter 50.8mm (2") ±0.1mm
Thickness 430µm ±10µm
Orientation C-plane to A 0.2°±0.1° off
Purity 99.999% (5N Al₂O₃)
TTV <5µm
Bow/Warp <20µm

 


 

Q&A

 

Q1: Why choose a 0.2° off-cut instead of standard C-plane?
A1: The 0.2° off-cut suppresses step-bunching during GaN epitaxy, improving layer uniformity and reducing defects in high-brightness LEDs and laser diodes.

 

Q2: How does 5N purity impact RF device performance?
A2: 99.999% purity minimizes dielectric losses at high frequencies, critical for 5G filters and low-noise amplifiers.

 

Q3: Can DSP wafers be used for direct bonding?
A3: Yes. DSP’s <0.3nm roughness enables atomic-level bonding for heterogenous integration (e.g., sapphire-on-silicon).

 

Q4: What’s the advantage of 430µm thickness?
A4: Balances mechanical strength (for handling) with thermal conductivity, optimal for rapid thermal processing.