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Home > Products > Semiconductor Equipment > 6-12 Inch 1064nm SiC Substrate Laser Separation System Machine Wafers Customized

6-12 Inch 1064nm SiC Substrate Laser Separation System Machine Wafers Customized

Product Details

Place of Origin: CHINA

Brand Name: ZMSH

Certification: rohs

Model Number: Laser Separation System Machine

Payment & Shipping Terms

Minimum Order Quantity: 5

Price: by case

Delivery Time: 3-6 months

Payment Terms: T/T

Supply Ability: 1000pcs per month

Get Best Price
Highlight:
​Laser Type​​:
Excimer (193nm/248nm), Femtosecond (343nm/1030nm)
​​Processing Area​​:
Max 150mm × 150mm
Processing Speed​​:
50–300mm/s
​​Lift-Off Thickness​​:
10nm–20μm
System Integration​​:
EFU Clean Unit, Exhaust Gas Treatment System
Application:
​​Semiconductor Manufacturing,​​​​Flexible Electronics​​
​Laser Type​​:
Excimer (193nm/248nm), Femtosecond (343nm/1030nm)
​​Processing Area​​:
Max 150mm × 150mm
Processing Speed​​:
50–300mm/s
​​Lift-Off Thickness​​:
10nm–20μm
System Integration​​:
EFU Clean Unit, Exhaust Gas Treatment System
Application:
​​Semiconductor Manufacturing,​​​​Flexible Electronics​​
6-12 Inch 1064nm SiC Substrate Laser Separation System Machine Wafers Customized

 

Laser separation system machine of system overview

 

6-12 Inch 1064nm SiC Substrate Laser Separation System Machine Wafers Customized 0

6-12 Inch 1064nm SiC Substrate Laser Separation System Machine Wafers Customized

 
 
 

The Laser Lift-Off (LLO) System is an advanced precision processing technology that utilizes high-energy pulsed lasers to achieve selective material separation at interfaces. This technology is widely applied in semiconductor manufacturing, flexible electronics, optoelectronic devices, and energy sectors. Its core advantages include ​​non-contact processing​​, ​​high-resolution control​​, and ​​multi-material compatibility​​, making it indispensable for applications such as MicroLED mass transfer, flexible display fabrication, and semiconductor wafer-level packaging.

 

 

​​Company Service Highlights​​:

 

​​Customized Solutions​​: Tailored laser wavelength (193nm–1064nm), power (1W–100W), and automation integration to support R&D and mass production.

​​Process Development​​: Laser parameter optimization, beam shaping design, and validation services (e.g., UV laser LLO for sapphire substrates).

​​Smart Maintenance​​: Integrated remote monitoring and fault diagnosis, ensuring 24/7 operational support with <2-hour response time.

 

 


 

Laser separation system machine of technical parameters​

 

 

Parameter​​ ​​Typical Values​​ ​​Notes​​
​​Laser Type​​ Excimer (193nm/248nm), Femtosecond (343nm/1030nm) Pulse width 5–20ns, peak power >10kW
​​Processing Area​​ Max 150mm × 150mm Multi-station parallel processing
​​Processing Speed​​ 50–300mm/s Adjustable per material and laser power
​​Lift-Off Thickness​​ 10nm–20μm Layer-by-layer delamination capability
​​System Integration​​ EFU clean unit, exhaust gas treatment system ISO 14644 cleanliness compliance

 

 


 

Laser separation system machine of working principle

6-12 Inch 1064nm SiC Substrate Laser Separation System Machine Wafers Customized 1

 

LLO operates through ​​selective ablation​​ at material interfaces:

 

​​Laser Irradiation​​: High-energy pulses (e.g., excimer or femtosecond lasers) focus on the target interface (e.g., sapphire-GaN), inducing photothermal/photochemical reactions.

​​Interface Decomposition​​: Laser energy triggers gasification (e.g., GaN → Ga + N₂), generating plasma and thermal stress for controlled delamination.

​​Material Collection​​: Delaminated microstructures are captured via vacuum suction or fluid dynamics, ensuring contamination-free transfer.

 

 

​​Key Technologies​​:

 

  • ​​Ultrafast Lasers​​: Femtosecond pulses (<100fs) minimize thermal damage (e.g., MicroLED separation).
  • ​​Beam Shaping​​: Linear/rectangular beam profiles enhance efficiency (e.g., flexible PCB batch processing).

 

 


 

System Features​​

 

​​Feature​​ ​​Technical Specifications​​ ​​Applications​​
​​Non-contact Processing​​ Laser energy transmitted via optics, avoiding mechanical stress on fragile materials Flexible OLED, MEMS
​​High Precision​​ Positioning accuracy ±0.02mm, energy density control ±1% MicroLED transfer, sub-μm patterning
​​Multi-material Compatibility​​ Supports UV (CO₂), visible (green), and IR lasers; compatible with metals, ceramics, polymers Semiconductors, medical devices, renewables
​​Intelligent Control​​ Integrated machine vision, AI-driven parameter optimization, automated loading/unloading 30%+ production efficiency improvement

 

 


Laser separation system machine of application fields

6-12 Inch 1064nm SiC Substrate Laser Separation System Machine Wafers Customized 2

 

​​1. Semiconductor Manufacturing​​

 

  • ​​Wafer-Level Packaging​​: Laser debonding for chip-on-wafer separation, enhancing yield.

  • ​​MicroLED/Microdisplay​​: Mass transfer of μm-scale LEDs to glass/PET substrates.

 

 

2. ​​Flexible Electronics​​

 

  • ​​Foldable Displays​​: Delamination of flexible circuits from glass substrates (e.g., Samsung Galaxy Fold).

  • ​​Sensor Fabrication​​: Precision stripping of piezoelectric ceramics for tactile sensors.

 

 

​​3. Medical Devices​​

6-12 Inch 1064nm SiC Substrate Laser Separation System Machine Wafers Customized 3

  • ​​Catheter Processing​​: Laser stripping of insulation layers for biocompatible leads.

  • ​​Implant Manufacturing​​: Titanium alloy coating removal for orthopedic implants.

 

 

4. ​​Renewables​​

 

  • ​​Perovskite Solar Cells​​: Transparent conductive electrode stripping for efficiency optimization.

  • ​​PV Modules​​: Laser scribing to reduce silicon wafer waste by 20%.
 

 


 

Laser separation system machine of FAQ

 

 

1. Q: What is a laser lift-off system?​​

    A: A laser lift-off system is a precision processing tool that uses high-energy pulsed lasers to selectively separate materials at interfaces, enabling applications like MicroLED mass transfer and flexible electronics manufacturing .

 

 

​​2. Q: What industries use LLO systems?​​

    A: LLO systems are critical in ​​semiconductor manufacturing​​ (wafer-level packaging), ​​flexible electronics​​ (foldable displays), ​​medical devices​​ (sensor fabrication), and ​​renewables​​ (solar cells), offering non-contact, high-resolution processing .

 

 

 

Tags: #6-12 Inch, #1064nm, # SiC Substrate Laser Separation System Machine, #Wafers Customized